| Degradable cross-linkers and strippable imaging materials for step-and-flash imprint lithography WH Heath, F Palmieri, JR Adams, BK Long, J Chute, TW Holcombe, ... Macromolecules 41 (3), 719-726, 2008 | 166 | 2008 |
| Space environmentally stable polyimides and copolyimides derived from [2, 4-bis (3-aminophenoxy) phenyl] diphenylphosphine oxide KA Watson, FL Palmieri, JW Connell Macromolecules 35 (13), 4968-4974, 2002 | 126 | 2002 |
| Laser ablation surface preparation for adhesive bonding of carbon fiber reinforced epoxy composites FL Palmieri, MA Belcher, CJ Wohl, KY Blohowiak, JW Connell International Journal of Adhesion and Adhesives 68, 95-101, 2016 | 115 | 2016 |
| Implementation of an imprint damascene process for interconnect fabrication GM Schmid, MD Stewart, J Wetzel, F Palmieri, J Hao, Y Nishimura, K Jen, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 102 | 2006 |
| Laser Ablative Surface Treatment for Enhanced Bonding of Ti-6Al-4V Alloy FL Palmieri, KA Watson, G Morales, T Williams, R Hicks, CJ Wohl, ... ACS applied materials & interfaces 5 (4), 1254-1261, 2013 | 63 | 2013 |
| Direct imprinting of dielectric materials for dual damascene processing MD Stewart, JT Wetzel, GM Schmid, F Palmieri, E Thompson, EK Kim, ... Microlithography 2005, 210-218, 2005 | 53 | 2005 |
| Design of reversible cross-linkers for step and flash imprint lithography imprint resists F Palmieri, J Adams, B Long, W Heath, P Tsiartas, CG Willson ACS nano 1 (4), 307-312, 2007 | 41 | 2007 |
| Feature filling modeling for step and flash imprint lithography S Chauhan, F Palmieri, RT Bonnecaze, CG Willson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 40 | 2009 |
| Hygrothermal aging of composite single lap shear specimens comprised of AF-555M adhesive and T800H/3900-2 adherends GA Knight, TH Hou, MA Belcher, FL Palmieri, CJ Wohl, JW Connell International Journal of Adhesion and Adhesives 39, 1-7, 2012 | 36 | 2012 |
| Vinyl ether formulations for step and flash imprint lithography EK Kim, MD Stewart, K Wu, FL Palmieri, MD Dickey, JG Ekerdt, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005 | 36 | 2005 |
| Tack measurements of prepreg tape at variable temperature and humidity C Wohl, FL Palmieri, A Forghani, C Hickmott, H Bedayat, B Coxon, ... CAMX Technical Conference, 12-14, 2017 | 33 | 2017 |
| Polymer infused composite metal foam as a potential aircraft leading edge material JC Marx, SJ Robbins, ZA Grady, FL Palmieri, CJ Wohl, A Rabiei Applied Surface Science 505, 144114, 2020 | 28 | 2020 |
| Picosecond laser surface treatment and analysis of thermoplastic composites for structural adhesive bonding RI Ledesma, FL Palmieri, Y Lin, MA Belcher, DR Ferriell, SK Thomas, ... Composites Part B: Engineering 191, 107939, 2020 | 26 | 2020 |
| Optimized surface treatment of aerospace composites using a picosecond laser FL Palmieri, RI Ledesma, JG Dennie, TJ Kramer, Y Lin, JW Hopkins, ... Composites Part B: Engineering 175, 107155, 2019 | 25 | 2019 |
| Surface characterization of carbon fiber reinforced polymers by picosecond laser induced breakdown spectroscopy R Ledesma, F Palmieri, J Connell, W Yost, J Fitz-Gerald Spectrochimica Acta Part B: Atomic Spectroscopy 140, 5-12, 2018 | 23 | 2018 |
| Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing CG Willson, F Palmieri, Y Nishimura, SC Johnson, MD Stewart US Patent 7,691,275, 2010 | 23 | 2010 |
| Multilevel step and flash imprint lithography for direct patterning of dielectrics WL Jen, F Palmieri, B Chao, M Lin, J Hao, J Owens, K Sotoodeh, ... Emerging Lithographic Technologies XI 6517, 175-183, 2007 | 23 | 2007 |
| Photocurable silicon-based materials for imprinting lithography J Hao, MW Lin, F Palmieri, Y Nishimura, HL Chao, MD Stewart, A Collins, ... Emerging Lithographic Technologies XI 6517, 657-665, 2007 | 23 | 2007 |
| Multilevel step and flash imprint lithography for direct patterning of dielectrics WL Jen, F Palmieri, B Chao, M Lin, J Hao, J Owens, K Sotoodeh, ... Emerging Lithographic Technologies XI 6517, 175-183, 2007 | 23 | 2007 |
| Dual damascene BEOL processing using multilevel step and flash imprint lithography BH Chao, F Palmieri, WL Jen, DH McMichael, CG Willson, J Owens, ... Emerging Lithographic Technologies XII 6921, 85-98, 2008 | 21 | 2008 |
Chris WohlResearch Materials Engineer, NASA Langley Research CenterVerified email at nasa.gov
