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Nazmul Arefin
Nazmul Arefin
Staff Research and Development Engineer, Intel Corporation
Verified email at intel.com
Title
Cited by
Cited by
Year
Gate length scaling beyond Si: mono-layer 2D channel FETs robust to short channel effects
CJ Dorow, A Penumatcha, A Kitamura, C Rogan, KP O’Brien, S Lee, ...
2022 International Electron Devices Meeting (IEDM), 7.5. 1-7.5. 4, 2022
112022
300 mm MOCVD 2D CMOS materials for more (than) Moore scaling
K Maxey, CH Naylor, KP O'Brien, A Penumatcha, A Oni, C Mokhtarzadeh, ...
2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2022
102022
Gallium nitride (GaN) on silicon substrates for LEDs
M Kane, N Arefin
Nitride Semiconductor Light-Emitting Diodes (LEDs), 1st Edition Materials …, 2014
82014
2D materials in the BEOL
CH Naylor, K Maxey, C Jezewski, KP O’Brien, AV Penumatcha, MS Kavrik, ...
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2023
42023
DrGaN: an Integrated CMOS Driver-GaN Power Switch Technology on 300mm GaN-on-Si with E-mode GaN MOSHEMT and 3D Monolithic Si PMOS
HW Then, M Radosavljevic, S Bader, A Zubair, H Vora, N Nair, P Koirala, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
22023
GaN growth on silicon based substrates using pulsed electron beam deposition (PED) process
N Arefin, MH Kane, PR Larson, VR Whiteside, K Hossain, BN Pritchett, ...
MRS Online Proceedings Library 1736, 95-100, 2014
12014
High Mobility TMD NMOS and PMOS Transistors and GAA Architecture for Ultimate CMOS Scaling
A Penumatcha, KP O’Brien, K Maxey, W Mortelmans, R Steinhardt, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
2023
Exploring manufacturability of novel 2D channel materials: 300 mm wafer-scale 2D NMOS & PMOS using MoS2, WS2, & WSe2
CJ Dorow, T Schram, Q Smets, KP O’Brien, K Maxey, CC Lin, L Panarella, ...
2023 International Electron Devices Meeting (IEDM), 1-4, 2023
2023
1Texas A & M University at Galveston, Galveston, TX, United States; 2University of Oklahoma, Norman, OK, United States
MH Kane, N Arefin
Nitride Semiconductor Light-Emitting Diodes (LEDs): Materials, Technologies …, 2017
2017
Growth of wide bandgap semiconductors using pulsed electron beam deposition (ped) process
N Arefin
2015
Revised Physical Alpha-Power Law Model for Ultrathin Oxide MOSFETs
N Arefin, F Ahmed, MR Rahman, QDM Khosru
2006 International Conference on Electrical and Computer Engineering, 514-517, 2006
2006
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Articles 1–11