Tom Leviant
Tom Leviant
KLA - Optical Metrology Division
Verified email at kla.com - Homepage
TitleCited byYear
Robust Magnetic Properties of a Sublimable Single-Molecule Magnet
E Kiefl, M Mannini, K Bernot, X Yi, A Amato, T Leviant, A Magnani, ...
ACS nano 10 (6), 5663-5669, 2016
212016
Accuracy in optical overlay metrology
B Bringoltz, T Marciano, T Yaziv, Y DeLeeuw, D Klein, Y Feler, I Adam, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778, 97781H, 2016
102016
Methods of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology
T Marciano, B Bringoltz, E Gurevich, I Adam, Z Lindenfeld, Z Zhao, Y Feler, ...
US Patent App. 15/198,902, 2016
52016
Quantum ignition of deflagration in the Fe 8 molecular magnet
T Leviant, A Keren, E Zeldov, Y Myasoedov
Physical Review B 90 (13), 134405, 2014
52014
Testing the radiation emanating from the molecular nanomagnet Fe 8 during magnetization reversals
T Leviant, S Hanany, Y Myasoedov, A Keren
Physical Review B 90 (5), 054420, 2014
32014
Accuracy improvements in optical metrology
B Bringoltz, E Gurevich, I Adam, Y Feler, D Alumot, Y Lamhot, N Sella, ...
US Patent App. 15/540,409, 2018
2018
Process resilient overlay target designs for advanced memory manufacture
J Lee, M Jung, H Lee, Y Kim, S Han, ME Adel, T Itzkovich, V Levinski, ...
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
2017
Accuracy In Optical Overlay Metrology The physics by which process variations determine accuracy and robustness of overlay metrology. January 18th, 2017-By: KLA
B Bringoltz, T Marciano, T Yaziv, Y DeLeeuw, D Klein, Y Feler, I Adam, ...
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