| Robust magnetic properties of a sublimable single-molecule magnet E Kiefl, M Mannini, K Bernot, X Yi, A Amato, T Leviant, A Magnani, ... ACS nano 10 (6), 5663-5669, 2016 | 54 | 2016 |
| Accuracy in optical overlay metrology B Bringoltz, T Marciano, T Yaziv, Y DeLeeuw, D Klein, Y Feler, I Adam, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 36 | 2016 |
| Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology T Marciano, B Bringoltz, E Gurevich, I Adam, Z Lindenfeld, Z Zhao, Y Feler, ... US Patent 10,831,108, 2020 | 34 | 2020 |
| Quantum ignition of deflagration in the Fe 8 molecular magnet T Leviant, A Keren, E Zeldov, Y Myasoedov Physical Review B 90 (13), 134405, 2014 | 8 | 2014 |
| Accuracy improvements in optical metrology B Bringoltz, E Gurevich, I Adam, Y Feler, D Alumot, Y Lamhot, N Sella, ... US Patent App. 15/540,409, 2018 | 6 | 2018 |
| Testing the radiation emanating from the molecular nanomagnet Fe 8 during magnetization reversals T Leviant, S Hanany, Y Myasoedov, A Keren Physical Review B 90 (5), 054420, 2014 | 3 | 2014 |
| System and method for application of harmonic detectivity as a quality indicator for imaging-based overlay measurements G Drachuck, T Leviant, D Gready US Patent 11,360,397, 2022 | 2 | 2022 |
| Accuracy improvements in optical metrology B Bringoltz, E Gurevich, I Adam, Y Feler, D Alumot, Y Lamhot, N Sella, ... US Patent 11,862,522, 2024 | | 2024 |
| Accuracy improvements in optical metrology B BRINGOLTZ, E GUREVICH, A Ido, Y FELER, D ALUMOT, Y LAMHOT, ... | | 2017 |
| Process resilient overlay target designs for advanced memory manufacture J Lee, M Jung, H Lee, Y Kim, S Han, ME Adel, T Itzkovich, V Levinski, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | | 2017 |
| Analyzing and utilizing landscapes T Marciano, B Bringoltz, E Gurevich, A Ido, Z Zeng, Y Feler, D Kandel, ... | | 2016 |
| Accuracy In Optical Overlay Metrology The physics by which process variations determine accuracy and robustness of overlay metrology. January 18th, 2017-By: KLA B Bringoltz, T Marciano, T Yaziv, Y DeLeeuw, D Klein, Y Feler, I Adam, ... | | |
