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Katsuyoshi Kodera
Katsuyoshi Kodera
Kioxia Corporation
Verified email at toshiba.co.jp
Title
Cited by
Cited by
Year
Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method
K Kodera, S Maeda, S Tanaka, S Mimotogi, Y Seino, H Yonemitsu, H Sato, ...
Alternative Lithographic Technologies V 8680, 222-228, 2013
322013
Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly
H Sato, H Yonemitsu, Y Seino, H Kato, M Kanno, K Kobayashi, ...
Alternative Lithographic Technologies V 8680, 352-357, 2013
222013
Directed self-assembly lithography using coordinated line epitaxy (COOL) process
Y Seino, Y Kasahara, H Sato, K Kobayashi, H Kubota, S Minegishi, ...
Alternative Lithographic Technologies VII 9423, 238-244, 2015
202015
Dispersive lineshape of the resistively‐detected NMR in the vicinity of Landau level filling ν= 1
K Kodera, H Takado, A Endo, S Katsumoto, Y Iye
physica status solidi c 3 (12), 4380-4383, 2006
202006
A novel simple sub-15 nm line-and-space patterning process flow using directed self-assembly technology
Y Seino, Y Kasahara, H Sato, K Kobayashi, K Miyagi, S Minegishi, ...
Microelectronic Engineering 134, 27-32, 2015
182015
Mask-layout creating method, apparatus therefor, and computer program product
K Kodera, C Kodama
US Patent 8,336,006, 2012
182012
Pattern evaluating method, pattern generating method, and computer program product
K Kodera, S Tanaka, T Kotani, S Nojima, S Inoue
US Patent App. 12/836,235, 2011
112011
RIE challenges for sub-15 nm line-and-space patterning using directed self-assembly lithography with coordinated line epitaxy (COOL) process
Y Kasahara, Y Seino, K Kobayashi, H Kanai, H Sato, H Kubota, T Tobana, ...
Advanced Etch Technology for Nanopatterning IV 9428, 124-130, 2015
92015
Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene-block-poly (methyl methacrylate)
T Azuma, Y Seino, H Sato, Y Kasahara, K Kobayashi, H Kubota, H Kanai, ...
Journal of Vacuum Science & Technology B 33 (6), 2015
72015
Sub-10-nm patterning process using directed self-assembly with high block copolymers
N Kihara, Y Seino, H Sato, Y Kasahara, K Kobayashi, K Miyagi, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (2), 023502-023502, 2015
72015
Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly (methyl methacrylate)
Y Kasahara, Y Seino, H Sato, H Kanai, K Kobayashi, H Kubota, K Miyagi, ...
Microelectronic Engineering 159, 21-26, 2016
62016
A Simulation Study on Defectivity in Directed Self-assembly Lithography
K Kodera, H Kanai, H Sato, Y Seino, K Kobayashi, Y Kasahara, H Kubota, ...
Journal of Photopolymer Science and Technology 28 (5), 683-688, 2015
62015
Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory
K Kodera, H Sato, H Kanai, Y Seino, N Kihara, Y Kasahara, K Kobayashi, ...
Alternative Lithographic Technologies VI 9049, 458-465, 2014
62014
Pattern generating method, manufacturing method of mask, and manufacturing method of semiconductor device
K Kodera, S Tanaka, T Kotani, S Inoue
US Patent App. 12/874,756, 2011
62011
Novel fine-tuned model-based SRAF generation method using coherence map
K Kodera, S Tanaka, M Yamaji, C Kodama, T Kotani, S Nojima, ...
Optical Microlithography XXIII 7640, 453-461, 2010
62010
Patterning strategy and performance of 1.3 NA tool for 32nm node lithography
S Mimotogi, M Satake, Y Kitamura, K Takahata, K Kodera, H Fujise, ...
Optical Microlithography XXI 6924, 206-214, 2008
52008
Patterning strategy and performance of 1.3 NA tool for 32nm node lithography
S Mimotogi, M Satake, Y Kitamura, K Takahata, K Kodera, H Fujise, ...
Optical Microlithography XXI 6924, 206-214, 2008
52008
Process and simulation studies of contact holes fabricated using directed self-assembly lithography
H Yonemitsu
2012 MRS Fall Meeting and Exhibit, 2012
42012
Sub-30 nm contact hole process study using directed self-assembly lithography
H Yonemitsu
25th International Microprocesses and Nanotechnology Conference (MNC2012), 2012
42012
Evaluation pattern generating method, computer program product, and pattern verifying method
K Kodera, S Tanaka, S Maeda, S Kyoh, S Inoue, R Ogawa
US Patent App. 12/536,900, 2010
42010
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Articles 1–20