| Resist blur and line edge roughness GM Gallatin Optical Microlithography XVIII 5754, 38-52, 2005 | 359 | 2005 |
| Ranging and velocimetry signal generation in a backscatter-modulated laser diode PJ de Groot, GM Gallatin, SH Macomber Applied optics 27 (21), 4475-4480, 1988 | 301 | 1988 |
| Nanomanufacturing: a perspective JA Liddle, GM Gallatin ACS nano 10 (3), 2995-3014, 2016 | 222 | 2016 |
| Hybrid illumination system for use in photolithography S Stanton, G Gallatin, M Oskotsky, F Zernike US Patent 5,631,721, 1997 | 127 | 1997 |
| Laser focusing of atomic beams GM Gallatin, PL Gould JOSA B 8 (3), 502-508, 1991 | 108 | 1991 |
| Lithography, metrology and nanomanufacturing JA Liddle, GM Gallatin Nanoscale 3 (7), 2679-2688, 2011 | 107 | 2011 |
| Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes DL Goldfarb, AP Mahorowala, GM Gallatin, KE Petrillo, K Temple, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 107 | 2004 |
| Interferometer and method for measuring characteristics of optically unresolved surface features P De Groot, MJ Darwin, RT Stoner, GM Gallatin, XC De Lega US Patent 7,324,214, 2008 | 106 | 2008 |
| Surface‐emitting distributed feedback semiconductor laser SH Macomber, JS Mott, RJ Noll, GM Gallatin, EJ Gratrix, SL O’Dwyer, ... Applied physics letters 51 (7), 472-474, 1987 | 95 | 1987 |
| Extendibility of chemically amplified resists: another brick wall? WD Hinsberg, FA Houle, MI Sanchez, JA Hoffnagle, GM Wallraff, ... Advances in Resist Technology and Processing XX 5039, 1-14, 2003 | 91 | 2003 |
| Fast model-based optical proximity correction AE Rosenbluth, GM Gallatin, RL Gordon, N Seong, AY Lvov, ... US Patent 7,079,223, 2006 | 90 | 2006 |
| Off axis alignment system for scanning photolithography D Angeley, S Drazkiewicz, G Gallatin US Patent 5,477,057, 1995 | 89 | 1995 |
| Printability verification by progressive modeling accuracy GM Gallatin, K Lai, M Mukherjee, AE Rosenbluth US Patent 7,512,927, 2009 | 83 | 2009 |
| Resolution, LER, and sensitivity limitations of photoresists GM Gallatin, P Naulleau, D Niakoula, R Brainard, E Hassanein, R Matyi, ... Emerging Lithographic Technologies XII 6921, 417-427, 2008 | 82 | 2008 |
| Fundamental limits to EUV photoresist GM Gallatin, P Naulleau, R Brainard Advances in Resist Materials and Processing Technology XXIV 6519, 387-396, 2007 | 79 | 2007 |
| Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization PP Naulleau, GM Gallatin Applied Optics 42 (17), 3390-3397, 2003 | 79 | 2003 |
| Backscatter-modulation velocimetry with an external-cavity laser diode PJ De Groot, GM Gallatin Optics letters 14 (3), 165-167, 1989 | 74 | 1989 |
| Nanomanufacturing with DNA origami: factors affecting the kinetics and yield of quantum dot binding SH Ko, GM Gallatin, JA Liddle Advanced Functional Materials 22 (5), 1015-1023, 2012 | 66 | 2012 |
| Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle GM Gallatin, JL Kreuzer, ML Nelson US Patent 5,559,601, 1996 | 66 | 1996 |
| Propagation of vortex electron wave functions in a magnetic field GM Gallatin, B McMorran Physical Review A 86 (1), 012701, 2012 | 56 | 2012 |
