Microsensors, MEMS, and smart devices JW Gardner, VK Varadan, OO Awadelkarim John Wiley & Sons, Inc., 2003 | 812 | 2003 |
Deep‐level transient spectroscopy and photoluminescence studies of electron‐irradiated Czochralski silicon OO Awadelkarim, H Weman, BG Svensson, JL Lindström Journal of applied physics 60 (6), 1974-1979, 1986 | 51 | 1986 |
Impact of polysilicon dry etching on 0.5 μm NMOS transistor performance: the presence of both plasma bombardment damage and plasma charging damage T Gu, M Okandan, OO Awadelkarim, SJ Fonash, JF Rembetski, P Aum, ... IEEE electron device letters 15 (2), 48-50, 1994 | 50 | 1994 |
Free radicals in X-irradiated single crystals of sucrose: a reexamination E Sagstuen, A Lund, O Awadelkarim, M Lindgren, J Westerling The Journal of Physical Chemistry 90 (22), 5584-5588, 1986 | 47 | 1986 |
Extracting the Richardson constant: IrOx/n-ZnO Schottky diodes K Sarpatwari, OO Awadelkarim, MW Allen, SM Durbin, SE Mohney Applied physics letters 94 (24), 2009 | 46 | 2009 |
Microscopic identification and electronic structure of a di-hydrogen–vacancy complex in silicon by optical detection of magnetic resonance WM Chen, OO Awadelkarim, B Monemar, JL Lindström, GS Oehrlein Physical review letters 64 (25), 3042, 1990 | 40 | 1990 |
Photoluminescence study of radiative channels in ion-implanted silicon OO Awadelkarim, A Henry, B Monemar, JL Lindström, Y Zhang, ... Physical Review B 42 (9), 5635, 1990 | 34 | 1990 |
Damage to n-MOSFETs from electrical stress relationship to processing damage and impact on device reliability L Trabzon, OO Awadelkarim Microelectronics Reliability 38 (4), 651-657, 1998 | 32 | 1998 |
Plasma‐charging damage to gate SiO2 and SiO2/Si interfaces in submicron n‐channel transistors: Latent defects and passivation/depassivation of defects by … OO Awadelkarim, SJ Fonash, PI Mikulan, YD Chan Journal of applied physics 79 (1), 517-525, 1996 | 31 | 1996 |
Electrical studies on plasma and reactive‐ion‐etched silicon A Henry, OO Awadelkarim, JL Lindström, GS Oehrlein Journal of applied physics 66 (11), 5388-5393, 1989 | 31 | 1989 |
Electrical properties of contact etched p‐Si: A comparison between magnetically enhanced and conventional reactive ion etching OO Awadelkarim, PI Mikulan, T Gu, KA Reinhardt, YD Chan Journal of applied physics 76 (4), 2270-2278, 1994 | 28 | 1994 |
Effects of barrier height inhomogeneities on the determination of the Richardson constant K Sarpatwari, SE Mohney, OO Awadelkarim Journal of Applied Physics 109 (1), 2011 | 27 | 2011 |
Electronic states created in p‐Si subjected to plasma etching: The role of inherent impurities, point defects, and hydrogen OO Awadelkarim, T Gu, PI Mikulan, RA Ditizio, SJ Fonash, KA Reinhardt, ... Applied physics letters 62 (9), 958-960, 1993 | 27 | 1993 |
Electrical and optical properties of gold‐doped n‐type silicon H Weman, A Henry, T Begum, B Monemar, OO Awadelkarim, ... Journal of applied physics 65 (1), 137-145, 1989 | 27 | 1989 |
On the capacitance of metal/high-k dielectric material stack/silicon structures J Jiang, OO Awadelkarim, DO Lee, P Roman, J Ruzyllo Solid-State Electronics 46 (11), 1991-1995, 2002 | 25 | 2002 |
Trapping site geometry of N2H+4 radical ion in x‐irradiated single crystals of N2H5HC2O4: An ENDOR study E Sagstuen, O Awadelkarim, A Lund, J Masiakowski The Journal of chemical physics 85 (6), 3223-3228, 1986 | 25 | 1986 |
Surface energy of Parylene C C Chindam, A Lakhtakia, OO Awadelkarim Materials Letters 153, 18-19, 2015 | 24* | 2015 |
Microfiber inclination, crystallinity, and water wettability of microfibrous thin-film substrates of Parylene C in relation to the direction of the monomer vapor during fabrication C Chindam, NM Wonderling, A Lakhtakia, OO Awadelkarim, W Orfali Applied Surface Science 345, 145-155, 2015 | 24 | 2015 |
A study of iron‐related centers in heavily boron‐doped silicon by deep‐level transient spectroscopy OO Awadelkarim, B Monemar Journal of applied physics 64 (11), 6306-6310, 1988 | 24 | 1988 |
Polycrystalline silicon thin films formed by metal-induced solid phase crystallization of amorphous silicon YZ Wang, OO Awadelkarim Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (6 …, 1998 | 22 | 1998 |