Artak Isoyan
Title
Cited by
Cited by
Year
Talbot lithography: Self-imaging of complex structures
A Isoyan, F Jiang, YC Cheng, F Cerrina, P Wachulak, L Urbanski, J Rocca, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
1112009
Defect-tolerant extreme ultraviolet nanoscale printing
L Urbanski, A Isoyan, A Stein, JJ Rocca, CS Menoni, MC Marconi
Optics letters 37 (17), 3633-3635, 2012
402012
High-efficiency low-absorption Fresnel compound zone plates for hard x-ray focusing [4783-11]
A Kuyumchyan, AA Isoyan, EV Shulakov, VV Aristov, M Kondratenkov, ...
PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 92-96, 2002
37*2002
Extreme ultraviolet holographic lithography: Initial results
YC Cheng, A Isoyan, J Wallace, M Khan, F Cerrina
Applied Physics Letters 90 (2), 023116, 2007
322007
4X reduction extreme ultraviolet interferometric lithography
A Isoyan, A Wüest, J Wallace, F Jiang, F Cerrina
Optics express 16 (12), 9106-9111, 2008
302008
Extreme ultraviolet/soft X-ray laser nano-scale patterning using the demagnified talbot effect
MC Marconi, L Urbanski, JJ Rocca, A Isoyan
US Patent 9,007,562, 2015
222015
A novel EUV exposure station for nanotechnology studies
J Wallace, YC Cheng, A Isoyan, Q Leonard, M Fisher, M Green, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2007
202007
Progress in extreme ultraviolet interferometric and holographic lithography
A Isoyan, YC Cheng, F Jiang, J Wallace, F Cerrina, S Bollepalli
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
172007
Defect tolerant extreme ultraviolet lithography technique
L Urbanski, W Li, JJ Rocca, CS Menoni, MC Marconi, A Isoyan, A Stein
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2012
132012
Analysis of a scheme for de-magnified Talbot lithography
L Urbanski, MC Marconi, A Isoyan, A Stein, CS Menoni, JJ Rocca
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
132011
Engineering study of extreme ultraviolet interferometric lithography
J Fan, YC Cheng, A Isoyan, F Cerrina
Journal of Micro/Nanolithography, MEMS, and MOEMS 8 (2), 021203, 2009
112009
Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin
A Isoyan, YC Cheng, F Jiang, J Wallace, M Efremov, P Nealey, F Cerrina
Proceedings of SPIE 6921, 69212R, 2008
82008
Fast photolithography process simulation to predict remaining resist thickness
A Isoyan, LS Melvin III
US Patent 8,473,271, 2013
72013
Predictive modeling for EBPC in EBDW
R Zimmermann, M Schulz, W Hoppe, HJ Stock, W Demmerle, A Zepka, ...
Photomask Technology 2009 7488, 74883J, 2009
52009
Modelling strategies for the incorporation and correction of optical effects in EUVL
P Pathak, Q Yan, T Schmoeller, E Croffie, A Isoyan, LS Melvin III
Microelectronic engineering 86 (4-6), 500-504, 2009
52009
Study of optical properties of X-ray system based on two zone plates
V Aristov, A Isoyan, V Kohn, A Kuyumchyan, E Shulakov, A Snigirev, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2007
52007
Восстановление Фурье-голограммы с помощью фазовой зонной пластинки для рентгеновского излучения
ВВ Аристов, АВ Куюмчан, АЮ Суворов, АА Исоян, КТ Труни
Микросистемная техника, 26-29, 2004
52004
Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources
PW Wachulak, MC Marconi, A Isoyan, L Urbanski, A Bartnik, ...
Opto-Electronics Review 20 (1), 1-14, 2012
42012
Process window modeling using focus balancing technique
A Isoyan, E Croffie, LS Melvin III
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
42011
Extreme ultraviolet holographic lithography with a table-top laser
A Isoyan, F Jiang, YC Cheng, P Wachulak, L Urbanski, J Rocca, ...
Alternative Lithographic Technologies 7271, 72713O, 2009
42009
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Articles 1–20