עקוב אחר
Charith Eranga Nanayakkara
Charith Eranga Nanayakkara
Senior Scientist, EMD Performance Materials
כתובת אימייל מאומתת בדומיין emdgroup.com
כותרת
צוטט על ידי
צוטט על ידי
שנה
Titanium dioxide photocatalysis in atmospheric chemistry
H Chen, CE Nanayakkara, VH Grassian
Chemical reviews 112 (11), 5919-5948, 2012
8502012
Sulfur dioxide adsorption and photooxidation on isotopically-labeled titanium dioxide nanoparticle surfaces: roles of surface hydroxyl groups and adsorbed water in the …
CE Nanayakkara, J Pettibone, VH Grassian
Physical Chemistry Chemical Physics 14 (19), 6957-6966, 2012
1182012
Titanium Dioxide Nanoparticle Surface Reactivity with Atmospheric Gases, CO2, SO2, and NO2: Roles of Surface Hydroxyl Groups and Adsorbed Water in the …
CE Nanayakkara, WA Larish, VH Grassian
The Journal of Physical Chemistry C 118 (40), 23011-23021, 2014
1012014
Enhancing the reactivity of Al/CuO nanolaminates by Cu incorporation at the interfaces
L Marín, CE Nanayakkara, JF Veyan, B Warot-Fonrose, S Joulie, A Estève, ...
ACS Applied Materials & Interfaces 7 (22), 11713-11718, 2015
832015
Surface Photochemistry of Adsorbed Nitrate: The Role of Adsorbed Water in the Formation of Reduced Nitrogen Species on α-Fe2O3 Particle Surfaces
CE Nanayakkara, PM Jayaweera, G Rubasinghege, J Baltrusaitis, ...
The Journal of Physical Chemistry A 118 (1), 158-166, 2014
812014
Surface Adsorption and Photochemistry of Gas-Phase Formic Acid on TiO2 Nanoparticles: The Role of Adsorbed Water in Surface Coordination, Adsorption …
CE Nanayakkara, JK Dillon, VH Grassian
The Journal of Physical Chemistry C 118 (44), 25487-25495, 2014
572014
Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone
LF Pena, CE Nanayakkara, A Mallikarjunan, H Chandra, M Xiao, X Lei, ...
The Journal of Physical Chemistry C 120 (20), 10927-10935, 2016
542016
Role of initial precursor chemisorption on incubation delay for molybdenum oxide atomic layer deposition
CE Nanayakkara, A Vega, G Liu, CL Dezelah, RK Kanjolia, YJ Chabal
Chemistry of Materials 28 (23), 8591-8597, 2016
292016
Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water
JP Klesko, R Rahman, A Dangerfield, CE Nanayakkara, T L’Esperance, ...
Chemistry of Materials 30 (3), 970-981, 2018
272018
Low-index, smooth Al2O3 films by aqueous solution process
CK Perkins, RH Mansergh, JC Ramos, CE Nanayakkara, DH Park, ...
Optical Materials Express 7 (1), 273-280, 2017
222017
Aqueous process to limit hydration of thin-film inorganic oxides
CK Perkins, RH Mansergh, DH Park, CE Nanayakkara, JC Ramos, ...
Solid State Sciences 61, 106-110, 2016
122016
In situ infrared absorption study of plasma-enhanced atomic layer deposition of silicon nitride
LF Peña, EC Mattson, CE Nanayakkara, KA Oyekan, A Mallikarjunan, ...
Langmuir 34 (8), 2619-2629, 2018
112018
Basic mechanisms of Al interaction with the ZnO surface
Y Gao, L Marín, EC Mattson, J Cure, CE Nanayakkara, JF Veyan, ...
The Journal of Physical Chemistry C 121 (23), 12780-12788, 2017
92017
Role of Trimethylaluminum in low temperature atomic layer deposition of silicon nitride
A Dangerfield, CE Nanayakkara, A Mallikarjunan, X Lei, RM Pearlstein, ...
Chemistry of Materials 29 (14), 6022-6029, 2017
52017
Reaction mechanisms of the atomic layer deposition of tin oxide thin films using tributyltin ethoxide and ozone
CE Nanayakkara, G Liu, A Vega, CL Dezelah, RK Kanjolia, YJ Chabal
Langmuir 33 (24), 5998-6004, 2017
52017
Methods Of Selectively Forming Metal-Containing Films
E Joby, J Woodruff, SS Hong, R Kanjolia, C Nanayakkara, C Dezelah
US Patent App. 17/796,559, 2023
2023
Process for the production of a molecular layer and electronic component comprising same
P Kirsch, S Resch, H Seim, J Woodruff, C Nanayakkara
US Patent App. 17/772,547, 2023
2023
Compounds And Methods For Selectively Forming Metal-Containing Films
C Nanayakkara, E Joby, J Woodruff, C Dezelah, SS Hong, R Kanjolia, ...
US Patent App. 17/776,788, 2022
2022
Solution-processed low-refractive index alumina-based thin films for anti-reflective coatings
C Perkins, M Gutierrrez-Higgins, V Gouliouk, R Mansergh, DH Park, ...
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 253, 2017
2017
Surface Chemistry of Molybdenum Oxide Atomic Layer Deposition: Role of Precursor Chemisorption on Nucleation Delay and Initiating the ALD Process
C. Nanayakkara, A. Vega, G. Liu, C. Dezelah, R. Kanjolia, Y. Chabal
AVS 63rd International Symposium & Exhibition, 2016
2016
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מאמרים 1–20