| Immersion lithography: photomask and wafer-level materials RH French, HV Tran Annual Review of Materials Research 39, 93-126, 2009 | 128 | 2009 |
| Acid catalyst mobility in resist resins MD Stewart, HV Tran, GM Schmid, TB Stachowiak, DJ Becker, CG Willson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 128 | 2002 |
| Study of resolution limits due to intrinsic bias in chemically amplified photoresists SV Postnikov, MD Stewart, HV Tran, MA Nierode, DR Medeiros, T Cao, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 101 | 1999 |
| Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results HV Tran, RJ Hung, T Chiba, S Yamada, T Mrozek, YT Hsieh, ... Macromolecules 35 (17), 6539-6549, 2002 | 82 | 2002 |
| 157 nm resist materials: Progress report C Brodsky, J Byers, W Conley, R Hung, S Yamada, K Patterson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 53 | 2000 |
| 157 nm resist materials: Progress report C Brodsky, J Byers, W Conley, R Hung, S Yamada, K Patterson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 53 | 2000 |
| Resist materials for 157-nm microlithography: an update RJP Hung, HV Tran, BC Trinque, T Chiba, S Yamada, D Sanders, ... Advances in Resist Technology and Processing XVIII 4345, 385-395, 2001 | 50 | 2001 |
| Resist materials for 157-nm microlithography: an update RJP Hung, HV Tran, BC Trinque, T Chiba, S Yamada, D Sanders, ... Advances in Resist Technology and Processing XVIII 4345, 385-395, 2001 | 50 | 2001 |
| Study of acid transport using IR spectroscopy and SEM MD Stewart, MH Somervell, HV Tran, SV Postnikov, CG Willson Advances in Resist Technology and Processing XVII 3999, 665-674, 2000 | 49 | 2000 |
| Intramolecular hydrogen transfers in vinyl chloride polymerization: routes to doubly branched structures and internal double bonds WH Starnes, VG Zaikov, HT Chung, BJ Wojciechowski, HV Tran, K Saylor, ... Macromolecules 31 (5), 1508-1517, 1998 | 48 | 1998 |
| New amorphous fluoropolymers of tetrafluoroethylene with fluorinated and non-fluorinated tricyclononenes. Semiconductor photoresists for imaging at 157 and 193 nm AE Feiring, MK Crawford, WB Farnham, J Feldman, RH French, CP Junk, ... Macromolecules 39 (9), 3252-3261, 2006 | 34 | 2006 |
| Fluoropolymer resist materials for 157nm microlithography HV Tran, RJ Hung, T Chiba, S Yamada, T Mrozek, YT Hsieh, ... Journal of Photopolymer Science and Technology 14 (4), 669-674, 2001 | 33 | 2001 |
| High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches RH French, V Liberman, HV Tran, J Feldman, DJ Adelman, RC Wheland, ... Optical Microlithography XX 6520, 639-650, 2007 | 31 | 2007 |
| Second generation fluids for 193nm immersion lithography RH French, W Qiu, MK Yang, RC Wheland, MF Lemon, AL Shoe, ... Optical Microlithography XIX 6154, 418-424, 2006 | 28 | 2006 |
| Advances in resists for 157-nm microlithography BC Trinque, BP Osborn, CR Chambers, YT Hsieh, SB Corry, T Chiba, ... Advances in Resist Technology and Processing XIX 4690, 58-68, 2002 | 26 | 2002 |
| Advances in resists for 157-nm microlithography BC Trinque, BP Osborn, CR Chambers, YT Hsieh, SB Corry, T Chiba, ... Advances in Resist Technology and Processing XIX 4690, 58-68, 2002 | 26 | 2002 |
| Bis (fluoroalcohol) monomers and polymers: Improved transparency fluoropolymer photoresists for semiconductor photolithography at 157 nm AE Feiring, MK Crawford, WB Farnham, RH French, KW Leffew, VA Petrov, ... Macromolecules 39 (4), 1443-1448, 2006 | 23 | 2006 |
| Recent advances in resists for 157 nm microlithography BC Trinque, T Chiba, RJ Hung, CR Chambers, MJ Pinnow, BP Osborn, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 17 | 2002 |
| DesMarteau; Conley, W.; Willson R Hung, HV Tran, B Trinque, T Chiba, S Yamada, D Sanders, E Connor, ... Proceedings of SPIE-The International Society for Optical Engineering 4345 …, 2001 | 15 | 2001 |
| Fluid-photoresist interactions and imaging in high-index immersion lithography HV Tran, E Hendrickx, F Van Roey, G Vandenberghe, RH French Journal of Micro/Nanolithography, MEMS and MOEMS 8 (3), 033006-033006-9, 2009 | 10 | 2009 |
