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Giorgos P. Gakis
Giorgos P. Gakis
Verified email at chemeng.ntua.gr
Title
Cited by
Cited by
Year
Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si
GP Gakis, C Vahlas, H Vergnes, S Dourdain, Y Tison, H Martinez, J Bour, ...
Applied Surface Science 492, 245-254, 2019
552019
Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water
GP Gakis, H Vergnes, E Scheid, C Vahlas, AG Boudouvis, B Caussat
Chemical Engineering Science 195, 399-412, 2019
432019
Computational fluid dynamics simulation of the ALD of alumina from TMA and H2O in a commercial reactor
GP Gakis, H Vergnes, E Scheid, C Vahlas, B Caussat, AG Boudouvis
Chemical Engineering Research and Design 132, 795-811, 2018
432018
Unraveling the mechanisms of carbon nanotube growth by chemical vapor deposition
GP Gakis, S Termine, AFA Trompeta, IG Aviziotis, CA Charitidis
Chemical Engineering Journal 445, 136807, 2022
342022
The effects of flow multiplicity on GaN deposition in a rotating disk CVD reactor
PA Gkinis, IG Aviziotis, ED Koronaki, GP Gakis, AG Boudouvis
Journal of Crystal Growth 458, 140-148, 2017
302017
Numerical investigation of multiple stationary and time-periodic flow regimes in vertical rotating disc CVD reactors
GP Gakis, ED Koronaki, AG Boudouvis
Journal of Crystal Growth 432, 152-159, 2015
232015
Metal and metal oxide nanoparticle toxicity: moving towards a more holistic structure–activity approach
GP Gakis, IG Aviziotis, CA Charitidis
Environmental Science: Nano 10 (3), 761-780, 2023
162023
Efficient tracing and stability analysis of multiple stationary and periodic states with exploitation of commercial CFD software
ED Koronaki, GP Gakis, N Cheimarios, AG Boudouvis
Chemical Engineering Science 150, 26-34, 2016
122016
Ιn situ N2-NH3 plasma pre-treatment of silicon substrate enhances the initial growth and restricts the substrate oxidation during alumina ALD
GP Gakis, H Vergnes, F Cristiano, Y Tison, C Vahlas, B Caussat, ...
Journal of Applied Physics 126 (12), 2019
72019
Multi-parametric analysis of the CVD of CNTs: Effect of reaction temperature, pressure and acetylene flow rate
GP Gakis, EN Skountzos, IG Aviziotis, CA Charitidis
Chemical Engineering Science 267, 118374, 2023
62023
Modeling of clearance, retention, and translocation of inhaled gold nanoparticles in rats
A Krikas, P Neofytou, GP Gakis, I Xiarchos, C Charitidis, L Tran
Inhalation Toxicology 34 (13-14), 361-379, 2022
62022
Metadata stewardship in nanosafety research: learning from the past, preparing for an “on-the-fly” FAIR future
TE Exner, AG Papadiamantis, G Melagraki, JD Amos, N Bossa, GP Gakis, ...
Frontiers in Physics 11, 1233879, 2023
42023
Modelling the biodistribution of inhaled gold nanoparticles in rats with interspecies extrapolation to humans
GP Gakis, A Krikas, P Neofytou, L Tran, C Charitidis
Toxicology and Applied Pharmacology 457, 116322, 2022
32022
A structure–activity approach towards the toxicity assessment of multicomponent metal oxide nanomaterials
GP Gakis, IG Aviziotis, CA Charitidis
Nanoscale 15 (40), 16432-16446, 2023
12023
Metadata stewardship in nanosafety research: learning from the past, preparing for an “on-the-fly” FAIR future
J Hooyberghs, S Herres-Pawlis, TE Exner, I Lynch, TE Exner, ...
2023
Modélisation multi-échelles et analyse expérimentale de l'ALD d'alumine: interactions entre dynamique du procédé, chimie de surface et phénomènes interfaciaux
G Gakis
Toulouse, INPT, 2019
2019
Multi-scale modelling and experimental analysis of ALD alumina: Interplay of process dynamics, chemistry and interfacial phenomena
G Gakis
Institut National Polytechnique de Toulouse-INPT; National technical …, 2019
2019
Computational mechanistic investigation of the initial growth of Alumina ALD: Effect of substrate pretreatment on nucleation period reduction
G Gakis, H Vergnes, E Scheid, AG Boudouvis, C Vahlas, B Caussat
Rafald 2018, 2018
2018
Experimental investigation and CFD-based analysis of an ALD reactor depositing alumina from TMA and water
G Gakis, H Vergnes, E Scheid, C Vahlas, B Caussat, AG Boudouvis
RAFALD 2017, 2017
2017
CFD analysis of an ALD reactor: gaseous species distribution and cycle time
G Gakis, H Vergnes, E Scheid, AG Boudouvis, C Vahlas, B Caussat
Workshop du Réseau des Acteurs Français de l'Atomic Layer Deposition (RAFALD), 0, 2016
2016
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