| Eliminating the trade‐off between the throughput and pattern quality of sub‐15 nm directed self‐assembly via warm solvent annealing JM Kim, YJ Kim, WI Park, YH Hur, JW Jeong, DM Sim, KM Baek, JH Lee, ... Advanced Functional Materials 25 (2), 306-315, 2015 | 66 | 2015 |
| Area-selective lift-off mechanism based on dual-triggered interfacial adhesion switching: highly facile fabrication of flexible nanomesh electrode S Yu, HJ Han, JM Kim, S Yim, DM Sim, H Lim, JH Lee, WI Park, JH Park, ... ACS nano 11 (4), 3506-3516, 2017 | 34 | 2017 |
| Block copolymer with an extremely high block-to-block interaction for a significant reduction of line-edge fluctuations in self-assembled patterns JM Kim, YH Hur, JW Jeong, TW Nam, JH Lee, K Jeon, YJ Kim, YS Jung Chemistry of Materials 28 (16), 5680-5688, 2016 | 33 | 2016 |
| In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer. JH Lee, Y Kim, JY Cho, SR Yang, JM Kim, S Yim, H Lee, YS Jung Advanced Materials (Deerfield Beach, Fla.) 27 (33), 4814-4822, 2015 | 25 | 2015 |
| Spontaneous registration of Sub-10 nm features based on subzero celsius spin-casting of self-assembling building blocks directed by chemically encoded surfaces JH Lee, HJ Choi, CH Lee, SW Song, JB Lee, D Huh, YS Nam, DY Jeon, ... ACS nano 12 (8), 8224-8233, 2018 | 9 | 2018 |
| Polarized ultraviolet emitters with Al wire-grid polarizers fabricated by solvent-assisted nanotransfer process S Oh, JH Lee, HJ Lee, YS Kim, J Cho, JH Park, KK Kim, YS Jung, SJ Park Nanotechnology 31 (4), 045304, 2019 | 5 | 2019 |
